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Image: Lithography Wavelength vs Resolution

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Description: The lithography wavelength has not changed much to match the required resolution. The required resolution has been achieved when necessary by a combination of resolution enhancement techniques such as off-axis illumination and phase-shift masks, higher numerical aperture lenses, and more recently fluid immersion. Beyond 45 nm node, the 193 nm wavelength is further extended by double patterning.
Title: Lithography Wavelength vs Resolution
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